The Relationship Between Metrology Patents and Quality Infrastructure

As we continue our efforts to measure quality infrastructure (QI) development and improve QI data collection to understand QI’s contribution to economic growth, we turn our attention to metrology. We examined the relationship between the Global Quality Infrastructure Index (GQII) and the number of metrology patents filed to understand whether it would be a suitable proxy for metrology development. We expect a strong positive relationship between the variables of interest, suggesting that countries with higher metrological competencies will likely have more metrology patent applications.

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BIPM’s Key Comparison Database

Quality Infrastructure Data

For ten years, we are dealing with the question of how to measure the development and performance of a country’s Quality Infrastructure.[1] Our continuous effort involves comparing the level of development of different countries and measuring the progress of development of a country’s Quality Infrastructure. You can compare this data with other indicators such as population size, economic power, competitiveness, exports, etc. The Quality Infrastructure measurement requires a reliable database in the areas of metrology, standardization, accreditation and conformity assessment. This blog post deals with metrology data and thereby initiates a series of blog post dedicated to QI-Data specifically.

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